M4L RF Plasma System | PVATePla America, Inc.
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M4L RF Gas Plasma System
  • Controller: Windows® O/S based touch screen interface offering fully automatic control.

  • Multi-step recipes, real time graphic display, multi-level password access, data logging, and real time SPC monitoring of all plasma parameters is provided.

  • Chamber: 9" X 13" X 20" Aluminum, with high-conductance KF 40 port and isolation valve. Optional throttle valve available.

  • Electrode options include 3-shelf, 5-shelf, and cage electrodes.

  • RF Generator: 300 or 600 watt 13.56 MHz air cooled with automatic impedance matching network.

  • Display: Color 10.4 inch touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments.

  • Two user specified gases, with 500 sccm MFCs standard, Optional 3rd gas channel available.

  • Power Requirements: 120- 240 volts, 1ø, 50/60 Hz 30 amps maximum, changeable in the field.

  • CE Certified


Safety and Security

  • Electronic and software interlocks

  • · RF power
    · Pressure
    · Chamber door open/close

  • Emergency OFF front and rear of reactor center and on wall box.

  • Password security for manual and edit modes.

  • Audible alarms.

  • Software alarm limits on critical process parameters.

  • Over-temperature alarm sensor (generator).

  • Hard-wired RF relay interlocked with process chamber door.

  • External interlock connection to extend 24 VAC control loop.

The M4L™ is our most popular full featured plasma surface modification system designed for laboratory and production use.

The M4L is ideal for:

  • Plasma surface modification
  • Plasma cleaning of organic surfaces
  • Bond strength enhancement
  • Plasma etch applications
  • Plasma asher applications
  • Increased or decreased wettability
  • Any other plasma system application

The entire bench top system fits in one cabinet, except for the vacuum pump. Never before has a professional plasma etch system been this loaded with features and priced this affordably!


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