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M4L RF Gas Plasma System
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- Controller: Windows® O/S based touch screen interface offering fully automatic control.
- Multi-step recipes, real time graphic display, multi-level password access, data logging, and real time SPC monitoring of all plasma parameters is provided.
- Chamber: 9" X 13" X 20" Aluminum, with high-conductance KF 40 port and isolation valve. Optional throttle valve available.
- Electrode options include 3-shelf, 5-shelf, and cage electrodes.
- RF Generator: 300 or 600 watt 13.56 MHz air cooled with automatic impedance matching network.
- Display: Color 10.4 inch touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments.
- Two user specified gases, with 500 sccm MFCs standard, Optional 3rd gas channel available.
- Power Requirements: 120- 240 volts, 1ø, 50/60 Hz 30 amps maximum, changeable in the field.
- CE Certified
Safety and Security
- Electronic and software interlocks
· RF power
· Pressure
· Chamber door open/close
- Emergency OFF front and rear of reactor center and on wall box.
- Password security for manual and edit modes.
- Audible alarms.
- Software alarm limits on critical process parameters.
- Over-temperature alarm sensor (generator).
- Hard-wired RF relay interlocked with process chamber door.
- External interlock connection to extend 24 VAC control loop.
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The M4L™ is our most popular full featured plasma surface modification system designed for laboratory and production use.
The M4L is ideal for:
- Plasma surface modification
- Plasma cleaning of organic surfaces
- Bond strength enhancement
- Plasma etch applications
- Plasma asher applications
- Increased or decreased wettability
- Any other plasma system application
The entire bench top system fits in one cabinet, except for the vacuum pump. Never before has a professional plasma etch system been this loaded with features and priced this affordably!
To Request a Brochure/Literature/Product CD, Click Here
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