IoN 100 Plasma System | PVATePla America, Inc.
   
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IoN 100 Gas Plasma System
  • Controller: Windows® O/S based touch screen interface offering fully automatic control.

  • Multi-step recipes, real time graphic display, multi-level password access, data logging, and real time SPC monitoring of all plasma parameters is provided.

  • Chamber: 9" X 13" X 20" Aluminum, with high-conductance KF 40 port and isolation valve. Optional throttle valve available.

  • Electrode options include 3-shelf, 5-shelf, and cage electrodes.

  • RF Generator: 300 or 600 watt 13.56 MHz air cooled with automatic impedance matching network.

  • Display: Color 10.4 inch touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments.

  • Two user specified gases, with 500 sccm MFCs standard, Optional 3rd gas channel available.

  • Power Requirements: 120- 240 volts, 1ø, 50/60 Hz 30 amps maximum, changeable in the field.

  • CE Certified


Safety and Security

  • Electronic and software interlocks

    • · RF power
    · Pressure
    · Chamber door open/close

  • Emergency OFF front and rear of reactor center and on wall box.

  • Password security for manual and edit modes.

  • Audible alarms.

  • Software alarm limits on critical process parameters.

  • Over-temperature alarm sensor (generator).

  • Hard-wired RF relay interlocked with process chamber door.

  • External interlock connection to extend 24 VAC control loop.

The IoN 100 is our latest advancement in vacuum plasma technology. Gas plasma is fast becoming the technology of choice for surface modification of materials in the life sciences, electronic and industrial arenas due to its versatility and low impact to our environment. For example, the trend towards miniaturization in medical diagnostics requires precision cleaning, and selective chemical functionalization. Plasma removes organic contamination several orders of magnitude more efficiently than wet chemical processing and can chemically functionalize surfaces at the nano-scale.  As a result, plasma is replacing older types of treatments that are no longer practical or economical.

The IoN 100 is designed to meet the evolving demands of our customers, emphasizing versatility and control for their surface treatment needs. Its advanced features provide state of the art process control, fail-safe system alarms and data capturing software. This enables the system to meet stringent quality control programs in the Life Science industries. The IoN 100 uses radio frequency (RF) generated plasma in a compact, fully integrated package. Another design feature of the new IoN 100 is the ability to quickly and easily alternate between different chamber types and electrode configurations.

Features include:

  • Flexible quick change electrode and chamber options
  • Plug and Play self installation
  • Onboard gas generator package option
  • Energy saving control feature for lowest cost of ownership
  • Configurable chamber that can accommodate various electrode
    configurations for small sized complex 3-dimensional parts or high
    volume large part processing
  • Industrial computer with a Windows® based system
  • Graphical User Interface (GUI) software complies with CFR Title 24 Part 11 and Semi E95-1101
  • User access control for separate process development, operator and maintenance programming and control
  • Configurable process tolerance controls allowing precise lot-to-lot repeatability
  • Remote statistical process control monitoring via Ethernet
  • Onboard diagnostic features and alarm logging
  • Recipe editor offers fast and versatile step control functionality
  • Liquid Crystal Display (LCD) touch panel and keyboard


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