Carbon Removal | Plasma Application | PVATePla America, Inc.
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Carbon Removal  

Anwendungen:

  Elektronik
Verkapselung
Bond Pad Reinigung
Polymer Bonding
  Printed Circuit Board
Desmear / Etch back
Teflon® Activation
Carbon removal
  Optische Datenträger
Reinigung
Passivierung
Veredelung
  Medizinische Anwendung
Aktivierung
Aminierung
Funktionalisierung
  Med. Verpackung
Mikrofluidik
Katheter
Med-Verpackung
Anti Bio-Fouling
  Elastomere
Oberflächenhaftung
Verkleben
  Optik
Linsenreinigung
Kontaktlinsen
Glasfaserkabel
   Halbleiter

Carbon removal

Metallization of through-vias is often impeded by carbonaceous deposits formed during laser drilling. To remove these deposits from vias, the printed circuit boards are immersed into gas plasma. The chemically energetic plasma safely cleans the carbon from the vias, in preparation for the metallization process. The carbon is converted into volatile reaction products that are completely removed from the plasma chamber by the vacuum pump.

Systeme:
4031 / 4061 / 4081
The plasma systems series 4031, 4061 and 4081 are high-capacity production tools for use in printed circuit board manufacturing.
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