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| RIBETCH 160 ECR |
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Ion Beam Etching System Ribetch 160-ECR This reactive ion beam etching system is used for microstructuring of microelectronic or electro-optical devices and is suitable for etching processes with argon ions (IBE) as well as for chemically reactive etching processes (RIBE, CAIBE). These systems have been successfully deployed by many research institutes and in the production of components for microelectronics, optoelectronics (III/V compounds), sensor technologies and micromechanics. RIBETCH 160 ECR
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