Plasma System 400 - 660 Solar | PVATePla America, Inc.
   
english | deutsch
  «Return to Applications   Details
GIGAbatch 690 Solar

Technical Specifications:

Plasma Chamber:
 Aluminum
 W x H x D = 400 x 400 x 400 mm

Plasma Generation:
 MW Frequency 2.45 GHz
 max. 1.000 Watt
 variable power

System Dimension:
W x H x D = approx. 1.050 x 1.750 x 800 mm

Weight:
 150 kg

Options:
 Vacuum Pump System
 Additional gas channels 3-4
 Aluminum rotary platform, 350 mm Ø
 Telescopic rotory stage
 Cell stack holder with stacking accessory

Related Applications:

  • Solar Cell Etching

    •  

    GIGAbatch 690 solar
    The Microwave Plasma System GIGAbatch 690 Solar is a dedicated and reliable plasma system widely used in solar cell manufacturing for edge isolation. The system features unique microwave source technology for high etch rate. The telescopic stage option allows for easy loading of the wafer stack. A loading bench assists wafer stacking and application of the cell clamp.

     

    Cell Clamp Loading Bench

            To Request a Brochure/Literature/Product CD, Click Here
    © 2010 PVA TePla America. All rights reserved.