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| MICROWAVE PLASMA SYSTEM GIGAFAB M |
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Technical Specifications: Plasma Chamber:
Plasma Generation:
System Dimension:
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Most compact version of the GIGAfab model family, targeting SU-8 Removal, MEMS Fabrication, Wafer Bumping and Flat Panel Display Technology. Featuring unique planar source geometry and temperature-controlled substrate plate for large area processing in R&D and production. Suitable for uniform processing of single large or multiple substrates for Descum, Ashing and Surface Conditioning. Microwave power: 2000 Watt max. Certified Hydrogen gas option available. To Request a Brochure/Literature/Product CD, Click Here
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