Plasma System 4008 | PVATePla America, Inc.
   
english | deutsch
  «Return to Applications   Details
MICROWAVE PLASMA SYSTEM GIGAFAB M

Technical Specifications:

Plasma Chamber:
 Aluminum
 W x H x D = 410 x 140 x 410 mm

Plasma Generation:
 MW Frequency 2.45 GHz
 max. 1600 Watt
 variable power

System Dimension:
 W x H x D = approx. 850 x 2.000 x 1300 mm
 Weight: 550 kg
 Options:
  Additional gas channels
  Vacuum pump

Related Applications:

  • Photoresist Ashing
  • SU8 Ashing
  •  

    Most compact version of the GIGAfab model family, targeting SU-8 Removal, MEMS Fabrication, Wafer Bumping and Flat Panel Display Technology.

    Featuring unique planar source geometry and temperature-controlled substrate plate for large area processing in R&D and production. Suitable for uniform processing of single large or multiple substrates for Descum, Ashing and Surface Conditioning.

    Microwave power: 2000 Watt max.
    Cooled substrate plate: 310 x 310 mm
    Manual substrate loading

    Certified Hydrogen gas option available.

    To Request a Brochure/Literature/Product CD, Click Here




    © 2010 PVA TePla America. All rights reserved.